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ed hardy clothing TSMC 28 nanometer design process

 
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PostWysłany: Pią 10:03, 24 Gru 2010    Temat postu: ed hardy clothing TSMC 28 nanometer design process

TSMC 28 nanometer design flow will be released into production next year, 1Q


To promote. Source: \) Automotive Associates, Ankai Auto Bus Company, joint research of the photocatalysts,[link widoczny dla zalogowanych], plasma hybrid passenger car air purifier sterilizer has finally successfully developed. The device mainly semiconductor materials using nano-TiO-based catalyst material, in a specific wavelength of ultraviolet irradiation, can generate strong and broad-spectrum bactericidal activity of role performance, the occurrence of redox capacity. Free electron and hole produced by strong oxidation and hydroxyl radicals to destroy bacteria, viruses, proteins and inhibit their activity, to death, the strongest in the air when the pathogen can kill 99.8%, in the set were closed to protect the long-distance bus driving oxygen maintained at about 21%, will not lead to human hypoxia and do not affect human health. Source: \, burning in the use of nanomaterials precursor made significant research progress, successfully prepared with a special structure and morphology of nano-materials, such as: g-FeO311SiO2-sided body of spherical magnetic nanoparticles and twenty-six sided g-FeO, nano crystal. These results have been published in the recent \Double-sided body to g-Fe0llSiO preparation of spherical magnetic nanoparticles, for example,[link widoczny dla zalogowanych], they use low boiling point reagents such as methanol as a solvent and fuel to iron acetylacetonate and TEOS as precursor, the precursor by direct combustion of methanol solution in flames have been defined structure of the g-Fe20311SiO: double-sided body of spherical magnetic nanoparticles. Detailed results show that iron acetylacetonate and TEOS flame in the flame core to form the first solid solution, and further including the formation of composite nanoparticles flame, with the occurrence of phase separation, the final part of the Waiyan formed by SiO. And g-Fe: 0. Body composition of double-sided magnetic nanoparticles. Similar results were reported in the literature are rare, because in normal conditions, the formation of solid solution of inorganic compounds, because of its high melting point component separation is not easy to produce through the heterostructure, but can not form a spherical two-sided structure. Nano-materials have high surface energy and low melting point shown, as well as to provide a high flame thousand degrees Celsius the reaction environment led directly to the body of these double-sided magnetic nanoparticles of spherical shape. Novel double-sided structure of the y-FeOttSiO: magnetic nanoparticles because of its special structure, performance of a very unique character. First, the double ferromagnetic particles,[link widoczny dla zalogowanych], but because of the presence of SiO, Fe magnetic composite particles still showed very good colloidal stability, and therefore the magnetic separation of biological samples have potential value; Secondly, the composite magnetic nanoparticles wins asymmetric double-sided structure makes it possible modification, such as through the SiO: selective hydrophobic side nanoparticles modified by surfactants shown in the ultrasound-assisted magnetic vesicles can be formed, and in the air / liquid interface is also performance the preferred orientation behavior; Finally, SiO: hydrofluoric acid etching may be the nature of double-sided structure-Fe20, IISiO magnetic nanoparticles as sacrificial templates can be used to build with the y-FezO, the magnetic core of the hollow capsules. Source: Institute of Chemistry, Chinese Academy of Sciences will issue a 28 nm TSMC process design into production next year lQ TSMC 40nm Chengshun Li from mass production, and actively down from generation to generation 28 nanometer process technology, process improvement, it is understood, TSMC is actively working within the 28 nm process research and development into mass production, but also plan will be officially released July 28 nanometer process technology, design process (Designflow) 10.0 version,[link widoczny dla zalogowanych], officially to provide design kits, is expected to be the fastest 2010 formally put into production in Q1, large customers are known, including TSMC graphics chip (GPU) NVIDIA has decided to adopt. It is understood that TSMC's 40 nanometer process in addition to major handset chip clients, including graphics chip and FPGA chips,[link widoczny dla zalogowanych], TSMC 40-nanometer process generation righting formally made a half generations to replace the whole generation process in general, while 28 nm process will also replace the 32-nanometer manufacturing process to become the next generation of TSMC's competitive weapon. 40,28 nm process in close collaboration with TSMC is the graphics chip industry clients. Source: HC network dependents put farming

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